lujames13

[{
  "answer": {
    "state": "IN_PROGRESS",
    "replies": [
      {
        "groundedContent": {
          "content": {
            "role": "model",
            "text": "**Analyzing Precursor Gases**\n\nI'm currently focusing on finding a suitable ALD precursor gas for selective SiO2 etching. The key constraints are low temperature, low pressure, non-volatile byproducts, and compatibility with semiconductor manufacturing, including stability and safety. I'm preparing to launch a Google search to find appropriate candidates.\n\n\n",
            "thought": true

lujames13

[{
  "answer": {
    "state": "IN_PROGRESS",
    "replies": [
      {
        "groundedContent": {
          "content": {
            "role": "model",
            "text": "好的，這是一個非常具體且專業的研究請求。為了有效地找到您需要的資訊，我將制定一個詳細的研究計畫。\n\n首先，我將進行初步的線上研究，以了解目前在低溫低壓條件下選擇性蝕刻SiO2的相關技術和可能的前驅物氣體。這將幫助我建立一個更完善、更貼近您需求的研究計畫。\n\n請稍候，我正在為您進行初步研究。\n好的，感謝您的耐心等候。在進行初步研究後，我為您制定了一份詳細的研究計畫，希望能協助您找到符合需求的ALD前驅物氣體。\n\n在我們開始深入研究之前，請您先過目這份計畫，看看是否符合您的預期，或是有任何需要調整的地方。"
          }

lujames13

[{
  "answer": {
    "state": "IN_PROGRESS",
    "replies": [
      {
        "groundedContent": {
          "content": {
            "role": "model",
            "text": "**Investigating Precursors**\n\nI'm currently focusing on identifying possible ALD precursor gases for selective SiO2 etching. The parameters are quite restrictive: low temperature and pressure, non-volatile byproducts, and of course, semiconductor-grade stability and safety. I'm working through the chemical space.\n\n\n",
            "thought": true